-10 years of experience in semiconductor R&D, with an extensive set of experimental skills in thin film CVD and etching using high-vacuum microwave and RF plasma tools -Expertise in essential materials characterization techniques ->5 years of experience in designing plasma etch chemistries for 300mm high-density plasma etchers for

Senior staff process engineer @ From April 2013 to Present (2 years 9 months) Member of Technical Staff @ - Developed front-end etch processes for variety of high/low-k dielectric and conductor materials in From November 2005 to March 2013 (7 years 5 months) Post Doctoral Research Associate @ Used plasma-enhanced CVD for room temperature deposition of nanocrystalline silicon thin films. Used in situ diagnostics and ex situ materials characterization to understand growth mechanisms of silicon films From September 2004 to November 2005 (1 year 3 months) Graduate student @ - Synthesized nanocrystalline diamond thin films using microwave plasma assisted CVD. Used materials characterization and diffraction simulations to understand the structure of diamond nuclei - Used Kinetic Monte Carlo simulations to understand the morphology of diamond crystals - Invented novel nanocomposite carbon materials and studied their application for electroanalytical detection of small concentrations of neurological fluids From 2000 to 2004 (4 years)

Ph.D., Chemical Engineering @ University of Louisville From 2000 to 2004 B. E., Chemical Engineering @ Maharaja Sayajirao University From 1996 to 2000 Radhika Mani is skilled in: Etching